High quality aluminum oxide passivation layer for crystalline silicon solar cells deposited by parallel-plate plasma-enhanced chemical vapor deposition

• Shinsuke Miyajima

• Junpei Irikawa

• Akira Yamada

書誌事項

タイトル別名

• High quality aluminum oxide passivation layer for crystalline silicon solar cells deposited by parallel plate plasma enhanced chemical vapor deposition

収録刊行物

• Applied physics express : APEX

  Applied physics express : APEX 3 (1), 2010-01

  Tokyo : Japan Society of Applied Physics

詳細情報

• CRID: 1520291855908651392
• NII論文ID: 10027012931
• NII書誌ID: AA12295133
• ISSN: 18820778
• NDL書誌ID: 10522156
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I10522156
• 本文言語コード: en
• NDL 雑誌分類:
  • ZM35(科学技術--物理学)
• データソース種別:
  • NDL
  • CiNii Articles