High quality aluminum oxide passivation layer for crystalline silicon solar cells deposited by parallel-plate plasma-enhanced chemical vapor deposition
Bibliographic Information
- Other Title
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- High quality aluminum oxide passivation layer for crystalline silicon solar cells deposited by parallel plate plasma enhanced chemical vapor deposition
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Journal
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- Applied physics express : APEX
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Applied physics express : APEX 3 (1), 2010-01
Tokyo : Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1520291855908651392
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- NII Article ID
- 10027012931
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- NII Book ID
- AA12295133
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- ISSN
- 18820778
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- NDL BIB ID
- 10522156
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- Text Lang
- en
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- NDL Source Classification
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- ZM35(科学技術--物理学)
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- Data Source
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- NDL
- CiNii Articles