Self-organization and Self-repair of a Two-dimensional Nanoarray of Ge Quantum Dots Epitaxially Grown on Si Substrates using Ultrathin SiO2 Films

• NAKAMURA Yoshiaki

  Graduate School of Engineering Science, Osaka University

• MURAYAMA Akiyuki

  Department of Applied Physics, Graduate School of Engineering, University of Tokyo

• WATANABE Ryoko

  Division of Integrated Molecular Engineering, Chemical Resources Laboratory, Tokyo Institute of Technology

• IYODA Tomokazu

  Division of Integrated Molecular Engineering, Chemical Resources Laboratory, Tokyo Institute of Technology

• ICHIKAWA Masakazu

  Department of Applied Physics, Graduate School of Engineering, University of Tokyo

Bibliographic Information

Other Title

• 極薄Ｓｉ酸化膜を用いたエピタキシャル量子ドット二次元ナノ配列構造の自己組織化と自己修復
• ゴクウス Si サンカ マク オ モチイタ エピタキシャル リョウシ ドット 2ジゲン ナノ ハイレツ コウゾウ ノ ジコ ソシキカ ト ジコ シュウフク

Abstract

We developed the self-organization technique of two-dimensional nanoarrays of Ge quantum dots (QDs) epitaxially grown on Si substrates using ultrathin SiO₂ films, which was featured by the ability to self-repair of the array defects. Nanometer-sized voids (nanovoids) were hexagonally patterned on ultrathin SiO₂ films by transcription of the pattern of block copolymer films using selective etching method. The nanovoids worked as nucleation sites for QD growth by Ge deposition onto the patterned ultrathin SiO₂ films to form the regularly arranged epitaxial QDs. There were some deficiency sites in the nanovoid arrays created by selective etching. These nanovoid deficiencies, which result in QD nanoarray defects, self-repaired during Ge deposition through the reaction of Ge atoms with the SiO₂ films at the nanovoid deficiency sites. The resulting epitaxial QD nanoarrays were elastically strain-relaxed without misfit dislocations and of uniform size owing to the regularly arranged nanovoids with ultrasmall size.

Journal

• Hyomen Kagaku

  Hyomen Kagaku 31 (12), 626-631, 2010

  The Surface Science Society of Japan

Keywords

• quantum dots
• self-organization
• self-repair
• epitaxial growth
• nanopatterning

Details

• CRID: 1390282681435417600
• NII Article ID: 10027573827
• NII Book ID: AN00334149
• DOI: 10.1380/jsssj.31.626
• ISSN: 18814743
• ISSN: 03885321
• NDL BIB ID: 10934828
• Web Site: http://id.ndl.go.jp/bib/10934828
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I10934828
• Web Site: http://www.jstage.jst.go.jp/article/jsssj/31/12/31_12_626/_pdf
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
  • KAKEN
• Abstract License Flag: Disallowed