Strong Pressure Effect in the Sublimation from Tetracene Single Crystals and Development of Surface Cleaning Technique for Organic Semiconductors

• Ohtomo, Manabu

• Itaka, Kenji

• Hasegawa, Tetsuya

• Shimada, Toshihiro

Abstract

We studied the sublimation of tetracene single crystals under vacuum and 1 atm inert gas to develop the surface cleaning technique for organic semiconductors. It was found that the microscopic sublimation behavior is strongly dependent on the gas pressure. Nanometer-scale roughening was observed after heating in vacuum, and layer-by-layer sublimation was observed under 1 atm Ar gas. Reflection high energy electron diffraction analysis of the topmost surface showed streak patterns, indicating that surface contaminants were successfully removed.

Journal

• Applied Physics Express

  Applied Physics Express 4 (2), 021601-1-021601-3, 2011

  The Japan Society of Applied Physics

Keywords

• tetracene single crystals
• surface cleaning technique
• organic semiconductors
• microscopic sublimation behavior

Details

• CRID: 1050564288960639744
• NII Article ID: 10027782937
• NII Book ID: AA12295133
• ISSN: 18820786
• ISSN: 18820778
• HANDLE: 2115/44910
• NDL BIB ID: 10981595
• Web Site: http://id.ndl.go.jp/bib/10981595
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I10981595
• Text Lang: en
• Article Type: journal article
• Data Source:
  • IRDB
  • NDL
  • CiNii Articles