Inactivation of Penicillium digitatum Spores by a High-Density Ground-State Atomic Oxygen-Radical Source Employing an Atmospheric-Pressure Plasma

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著者

    • Iseki Sachiko Iseki Sachiko
    • Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
    • Jia Fengdong [他] Jia Fengdong
    • Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
    • Takeda Keigo
    • Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
    • Ishikawa Kenji
    • Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
    • Ohta Takayuki
    • Department of Electrical and Electronic Engineering, Faculty of Science and Technology, Meijo University, Nagoya 468-8502, Japan
    • Ito Masafumi
    • Department of Electrical and Electronic Engineering, Faculty of Science and Technology, Meijo University, Nagoya 468-8502, Japan
    • Hori Masaru
    • Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan

抄録

Penicillium digitatum spores were inactivated using an oxygen-radical source that supplies only neutral oxygen radicals. Vacuum ultraviolet absorption spectroscopy was used to measure the ground-state atomic oxygen [O (3Pj)] densities and they were estimated to be in the range of 10^{14}--10^{15} cm-3. The inactivation rate of P. digitatum spores was correlated with the O (3Pj) density. The result indicates that O (3Pj) is the dominant species in the inactivation. The inactivation rate constant of P. digitatum spores by O (3Pj) was estimated to be on the order of 10^{-17} cm3 s-1 from the measured O (3Pj) densities and inactivation rates.

収録刊行物

  • Applied physics express

    Applied physics express 4(11), 116201-116201-3, 2011-11-25

    The Japan Society of Applied Physics

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各種コード

  • NII論文ID(NAID)
    10030153885
  • NII書誌ID(NCID)
    AA12295133
  • 本文言語コード
    EN
  • 資料種別
    SHO
  • ISSN
    18820778
  • NDL 記事登録ID
    023321442
  • NDL 請求記号
    Z78-A526
  • データ提供元
    CJP書誌  NDL  JSAP 
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