Surface-sensitive Chemical Analysis of Organic Insulating Thin Films Using Negative Secondary Ions Induced by Medium Energy C60 Impacts

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著者

    • Hirata Kouichi Hirata Kouichi
    • National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8565, Japan
    • Saitoh Yuichi Saitoh Yuichi
    • Takasaki Advanced Radiation Research Institute (TARRI), Japan Atomic Energy Agency (JAEA), Takasaki, Gumma 370-1292, Japan
    • Yamada Keisuke
    • Takasaki Advanced Radiation Research Institute (TARRI), Japan Atomic Energy Agency (JAEA), Takasaki, Gumma 370-1292, Japan
    • Narumi Kazumasa
    • Takasaki Advanced Radiation Research Institute (TARRI), Japan Atomic Energy Agency (JAEA), Takasaki, Gumma 370-1292, Japan

抄録

We report on the surface-sensitive chemical analysis of organic insulating thin films using negative secondary ions (N-SIs) induced by C60 impacts in the medium energy range from several tens to several hundreds keV. The incident C60 energy dependence of emission yields of characteristic N-SIs for poly(methyl methacrylate) and charging effects on the N-SI mass spectra were investigated using time-of-flight SI mass spectrometry. Our results show that medium energy C60 impacts stably provide considerably high characteristic N-SI yields without charge compensation, and demonstrate that time-of-flight SI mass spectrometry with medium energy C60 impacts is advantageous for the highly-sensitive chemical analysis of organic insulators.

収録刊行物

  • Applied physics express

    Applied physics express 4(11), 116202-116202-3, 2011-11-25

    The Japan Society of Applied Physics

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各種コード

  • NII論文ID(NAID)
    10030153905
  • NII書誌ID(NCID)
    AA12295133
  • 本文言語コード
    EN
  • 資料種別
    SHO
  • ISSN
    18820778
  • NDL 記事登録ID
    023321454
  • NDL 請求記号
    Z78-A526
  • データ提供元
    CJP書誌  NDL  JSAP 
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