Failure Mechanisms of W/TiN/Ti Metal Lines under High Current Stressing

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Current-induced morphological changes of W/TiN/Ti metal lines under voltage stressing in the range of 1.2--20 V were studied for 50- and 100-nm-wide lines. The relationship between the median time to failure and current density showed a power law dependence with two different exponent values depending on the applied current density level, irrespective of the line width. Self-heating-assisted electromigration, and melting and agglomeration are suggested as the dominant mechanisms in the low- and high-current-density regions, respectively.

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  • Applied physics express

    Applied physics express 5(2), 025801-025801-3, 2012-02-25

    The Japan Society of Applied Physics

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各種コード

  • NII論文ID(NAID)
    10030155964
  • NII書誌ID(NCID)
    AA12295133
  • 本文言語コード
    EN
  • 資料種別
    SHO
  • ISSN
    18820778
  • NDL 記事登録ID
    023454530
  • NDL 請求記号
    Z78-A526
  • データ提供元
    CJP書誌  NDL  JSAP 
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