フレキシブルデバイス創製に向けたプラズマ-ソフトマテリアル相互作用の解析 Investigations on Plasma Interactions with Soft Materials for Fabrication of Flexible Devices

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著者

    • 趙 研 CHO Ken
    • 大阪大学接合科学研究所 Joining and Welding Research Institute, Osaka University
    • 関根 誠 SEKINE Makoto
    • 名古屋大学プラズマナノ工学研究センター Plasma Nanotechnology Research Center, Nagoya University
    • 堀 勝 HORI Masaru
    • 名古屋大学プラズマナノ工学研究センター Plasma Nanotechnology Research Center, Nagoya University
    • 白谷 正治 SHIRATANI Masaharu
    • 科学技術振興機構・戦略的創造推進事業 Core Research for Evolutional Science and Technology, Japan Science and Technology Agency
    • 関根 誠 SEKINE Makoto
    • 名古屋大学プラズマナノ工学研究センター Plasma Nanotechnology Research Center, Nagoya University
    • 関根 誠 SEKINE Makoto
    • 科学技術振興機構・戦略的創造推進事業 Core Research for Evolutional Science and Technology, Japan Science and Technology Agency
    • 堀 勝 HORI Masaru
    • 名古屋大学プラズマナノ工学研究センター Plasma Nanotechnology Research Center, Nagoya University
    • 堀 勝 HORI Masaru
    • 科学技術振興機構・戦略的創造推進事業 Core Research for Evolutional Science and Technology, Japan Science and Technology Agency

抄録

  Interactions of ions, radicals and photons in VUV-UV regions from Ar plasmas and Ar-O<SUB>2</SUB> mixture plasmas with polymer surfaces were investigated on the basis of surface morphological changes and depth analyses of chemical bonding states in the nano-surface layer of polyethylene terephthalate (PET) films. The depth analyses of chemical bonding states were carried out with hard x-ray photoelectron spectroscopy (HXPES) and conventional x-ray photoelectron spectroscopy (XPS). The AFM images indicated that oxygen ions and/or radicals have a significant effect on the surface morphology. The HXPES results indicated that the degradation of the chemical bonding states due to the plasma exposure was insignificant in deeper regions up to about 50 nm from the surface. Whereas, the conventional XPS analysis showed that C-O bond and O=C-O bond decreased after exposure to the Ar plasmas which have high energy ion (over 7 eV). Furthermore, the C-O bond and the O=C-O bond increased after exposure to the Ar-O<SUB>2</SUB> mixture plasma and VUV-UV photons from the plasma. These results suggest that it is possible to prevent the decomposition of functional groups via controlling the plasma to suppress the ion energy less than 6eV. Moreover, it is important to control reactive species and VUV-UV photons for development low-temperature and low-damage plasma processes.

収録刊行物

  • 高温学会誌

    高温学会誌 37(6), 289-297, 2011-11-20

    一般社団法人 スマートプロセス学会 (旧高温学会)

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各種コード

  • NII論文ID(NAID)
    10030167027
  • NII書誌ID(NCID)
    AN00080051
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    03871096
  • NDL 記事登録ID
    023339752
  • NDL 請求記号
    Z15-317
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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