高温加熱処理によるマイクロ光造形樹脂の細胞毒性低減手法 Reduction of Cytotoxicity by High Temperature Heat Treatment for Microstereolithography

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著者

    • 井上 佳則 INOUE Yoshinori F.
    • 名古屋大学大学院工学研究科マイクロ・ナノシステム工学専攻 Department of Micro/Nano Systems Engineering, Graduate School of Engineering, Nagoya University
    • 生田 幸士 IKUTA Koji
    • 名古屋大学大学院工学研究科マイクロ・ナノシステム工学専攻 Department of Micro/Nano Systems Engineering, Graduate School of Engineering, Nagoya University

抄録

Microstereolithography is a well known method for three dimensional microfabrication. Despite wide needs for microdevices from biotechnological and medical industries, microstereolithography cannot be applied to those fields because photocurable resins used in conventional stereolithography system are not cytocompatibile. To overcome this problem, we have been working on new post-bake process to provide cytocompatibility to conventional photocurable resin. <br> In this report, stereolithographic objects with transparency and cytocompatibility were realized by a high temperature post-bake process in nitrogen atmosphere. By using MTT assay, precise post-bake conditions both in air and nitrogen were investigated. Transparency of post-baked photocurable resin was increased by processing in nitrogen atmosphere. In addition, the aqueous solution of the generated gas during post-bake process and the eluted substance from non-treated Photocurable resin had the same spectrum peak at around 245 nm. This result indicated that cytotoxicity of photocurable resin was reduced due to sublimation and diffusion of cytotoxicic substances from cured photocurable resin.<br> The new post-bake process developed herein should be a fundamental fabrication technology for future development of medical micromachines, portable health care devices and tissue engineering devices.

収録刊行物

  • Journal of Japan Society of Computer Aided Surgery : J.JSCAS

    Journal of Japan Society of Computer Aided Surgery : J.JSCAS 13(2), 67-73, 2011-09-30

    一般社団法人 日本コンピュータ外科学会

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各種コード

  • NII論文ID(NAID)
    10030199047
  • NII書誌ID(NCID)
    AA11908088
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    13449486
  • NDL 記事登録ID
    023683006
  • NDL 請求記号
    Z74-B824
  • データ提供元
    CJP書誌  CJP引用  NDL  J-STAGE 
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