Analysis of Multilayered Oxide and Sulfide Film Formed on Copper Plate in Sulfur Containing Environment

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  • Sakai Masahiro
    College of Design and Manufacturing Technology, Muroran Institute of Technology
  • Araya Shinta
    Division of Aerospace Engineering, Muroran Institute of Technologyy

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Other Title
  • 硫黄を含む環境下で銅上に生成した酸化物および硫化物から成る層状皮膜の分析
  • イオウ オ フクム カンキョウ カ デ ドウ ジョウ ニ セイセイ シタ サンカブツ オヨビ リュウカブツ カラ ナル ソウジョウ ヒマク ノ ブンセキ

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Abstract

Copper plates were exposed in sulfur containing atmosphere made by sodium sulfide solutions for up to 180 days. The cathodic reduction method was used to execute the qualitative analysis of the film formed on copper plate. The thickness and constituents of the film have been investigated by cross-sectional observation and EPMA analysis. Cathodic reduction curves revealed that the film was mainly composed of CuO, Cu2O and Cu2S. The thickness of the film formed in sulfur containing atmosphere made by 1 wt%Na2S solution has increased with an increase in an exposure period and reached about 40μm for 180 days. Multilayered film composed of sulfide and oxide was identified by the EPMA analysis.

Journal

  • Zairyo-to-Kankyo

    Zairyo-to-Kankyo 61 (3), 109-112, 2012

    Japan Society of Corrosion Engineering

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