A Novel Coating Method for Rare Earth Metal Oxide Films and Their Tribological Properties(Part 2)

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Other Title
  • 希土類酸化物薄膜の新規な創製法の確立とそのトライボロジー特性(第2報)
  • 希土類酸化物薄膜の新規な創製法の確立とそのトライボロジー特性(第2報)イットリウム酸化物薄膜
  • キドルイ サンカブツ ハクマク ノ シンキ ナ ソウセイホウ ノ カクリツ ト ソノ トライボロジー トクセイ(ダイ2ホウ)イットリウム サンカブツ ハクマク
  • ―Yttrium Oxide Film―
  • ―イットリウム酸化物薄膜―

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Abstract

Yttrium oxide, Y2O3, was deposited on a Si (001) substrate in ultrahigh vacuum by the simultaneous irradiation of arc plasma of yttrium and hyperthermal atomic oxygen, the principles and procedures of which were introduced in the preceding article. X-ray photoelectron spectroscopy revealed that the stoichiometry of Y2O3 was identical from the top to the bottom of the film. Y2O3 film deposited at a substrate temperature of 300℃, followed by a post-annealing process at 700℃, showed a low friction coefficient of approximately 0.1. At +high deposition temperatures, e.g. 500℃ and 700℃, faint Si2p peak was detected at an early stage of Ar depth profiling. Presumably, this may lead to inferior film properties. Low friction as well as good adhesion property of Y2O3 film to the Si(001) seems applicable to protective coating of MEMS (microelectromechanical systems) and other Si technologies.

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