ポリメタクリル酸メチル樹脂の水素プラズマ曝露と低エネルギーアルゴンイオンビームによるエッチング

• 吉村 智

  Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University

• 幾世 和将

  Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University

• 杉本 敏司

  Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University

• 村井 健介

  National Institute of Advanced Industrial Science and Technology (AIST)

• 木内 正人

  Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University National Institute of Advanced Industrial Science and Technology (AIST)

• 浜口 智志

  Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University

書誌事項

タイトル別名

• Hydrogen Plasma Exposure of Polymethylmethacrylate and Etching by Low Energy Ar⁺ Ion Beam
• ポリメタクリルサン メチル ジュシ ノ スイソ プラズマ バクロ ト テイエネルギーアルゴンイオンビーム ニ ヨル エッチング
• Hydrogen Plasma Exposure of Polymethylmethacrylate and Etching by Low Energy Ar+ Ion Beam

抄録

  Effects of hydrogen plasma exposure in polymer dry etching processes have been investigated with a low-energy mass-selected ion beam system. In the present study, we use a spin-coated polymethylmethacrylate (PMMA) film on a quartz crystal microbalance as a model polymer. The surface modification of the PMMA film by the hydrogen plasma exposure in an inverter plasma system was investigated by X-ray photoelectron spectroscopy (XPS) and spectroscopic ellipsometry. XPS results show that oxygen atoms were preferentially sputtered from the PMMA film by the hydrogen plasma exposure. Spectroscopic ellipsometry results show that depth of the modified layer of the hydrogen plasma exposed PMMA film was about 40 nm. Etching yields of the pristine PMMA film and the hydrogen plasma exposed PMMA film by 470 eV Ar⁺ ion beam injections were measured. It is found that the etching yield of the hydrogen plasma exposed PMMA film was about half of that of the pristine PMMA film.<br>

収録刊行物

• Ｊｏｕｒｎａｌ　ｏｆ　ｔｈｅ　Ｖａｃｕｕｍ　Ｓｏｃｉｅｔｙ　ｏｆ　Ｊａｐａｎ

  Ｊｏｕｒｎａｌ　ｏｆ　ｔｈｅ　Ｖａｃｕｕｍ　Ｓｏｃｉｅｔｙ　ｏｆ　Ｊａｐａｎ 56 (4), 129-132, 2013

  一般社団法人 日本真空学会

キーワード

• Spectroscopy
• Surfaces and Interfaces
• Instrumentation
• General Materials Science

詳細情報

• CRID: 1390282680272825728
• NII論文ID: 10031163964
• NII書誌ID: AA12298652
• DOI: 10.3131/jvsj2.56.129
• BIBCODE: 2013JVSJ...56..129Y
• COI: 1:CAS:528:DC%2BC3sXhtVKjt77E
• ISSN: 18824749
• ISSN: 18822398
• NDL書誌ID: 024633811
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I024633811
• 本文言語コード: ja
• データソース種別:
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  • NDL
  • Crossref
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  • KAKEN
• 抄録ライセンスフラグ: 使用不可