Rare-earth Plasma Beyond Extreme Ultraviolet (BEUV) Sources at 6.<i>x</i> nm

• Otsuka Takamitsu

  Faculty of Engineering, Utsunomiya University School of Physics, University College Dublin

• Higashiguchi Takeshi

  Faculty of Engineering, Utsunomiya University

• Yugami Noboru

  Faculty of Engineering, Utsunomiya University

Bibliographic Information

Other Title

• 6.<i>x</i> nm領域における希土類プラズマ極端紫外光源
• 6.x nm領域における希土類プラズマ極端紫外光源
• 6.x nm リョウイキ ニ オケル キドルイ プラズマ キョクタン シガイ コウゲン

Abstract

We have studied self-absorption effects of a laser-produced plasma (LPP) source at 6.xnm as a function of laser pulse duration and viewing angle. The spectral profiles are shown to have a strong dependence on viewing angle. Absorption effects are less pronounced when a 150-ps pulse duration is used due to reduced opacity resulting from plasma expansion. Conversion efficiencies and ion energies are also measured as a function of laser pulse duration and laser power density. A maximum conversion efficiency of 0.4% within a 0.6% bandwidth was measured, and lower ion kinetic energy was observed. It is concluded that in order to reduce self-absorption effects and ion yields, and increase conversion efficiencies, a short pulse duration should be used.

Journal

• IEEJ Transactions on Fundamentals and Materials

  IEEJ Transactions on Fundamentals and Materials 133 (10), 526-531, 2013

  The Institute of Electrical Engineers of Japan

Keywords

• extreme ultraviolet lithography (EUVL)
• extreme ultraviolet (EUV)
• laser-produced plasma (LPP)

Details

• CRID: 1390282679576976896
• NII Article ID: 10031200959
• NII Book ID: AN10136312
• DOI: 10.1541/ieejfms.133.526
• ISSN: 13475533
• ISSN: 03854205
• NDL BIB ID: 024946457
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I024946457
• Web Site: https://www.jstage.jst.go.jp/article/ieejfms/133/10/133_526/_pdf
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
  • KAKEN
• Abstract License Flag: Disallowed