Surface Structure and Void Formation in Thin Film Growth: A Monte Carlo Simulation

• Yutaka Kaneko

• Yasuaki Hiwatari

• Katsuhiko Ohara

• Tohru Murakami

抄録

The structure of thin film deposited on metal surfaces and void formation in the film have been studied with use of a Monte Carlo method. We extended the solid-on-solid model so that vacancies are created during the growth of the film and performed simulations for a two-dimensional square lattice model. It is shown that the spatial distribution of vacancies is closely related to the surface structure and voids are created as small holes are filled with deposited atoms.

収録刊行物

• Progress of Theoretical Physics Supplement

  Progress of Theoretical Physics Supplement 138 126-127, 2000

  Oxford University Press (OUP)

キーワード

• Physics and Astronomy (miscellaneous)

詳細情報

• CRID: 1360284921854182272
• NII論文ID: 110001210901
• NII論文ID: 210000127043
• NII書誌ID: AA00791466
• DOI: 10.1143/ptps.138.126
• ISSN: 03759687
• Web Site: http://academic.oup.com/ptps/article-pdf/doi/10.1143/PTPS.138.126/5301889/138-126.pdf
• Web Site: http://dl.ndl.go.jp/info:ndljp/pid/10884710
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