球状単結晶シリコンの異方性エッチングによるマイクロ形状創成  [in Japanese] Micro Structure Fabrication in Ball Semiconductor by Anisotropic Etching  [in Japanese]

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Author(s)

Abstract

It is known that a high performance micro system for the medical treatment, biotechnology, and nanotechnology etc, become a system where the electric circuit and the sensor are integrated on flat surface and spherical surface etc. In the future, anisotropic etching for spherical single-crystal silicon can be a key technique in order to develop a higher performance micro system. This paper has investigated the result of microstructure fabrication in spherical single-crystal silicon by anisotropic etching, and proposed a selection indicator in the line direction of mask pattern (crystal orientation), which is corresponded to users.

Journal

  • Journal of the Japan Society for Precision Engineering

    Journal of the Japan Society for Precision Engineering 69(7), 960-964, 2003-07-05

    The Japan Society for Precision Engineering

References:  8

Codes

  • NII Article ID (NAID)
    110001368497
  • NII NACSIS-CAT ID (NCID)
    AN1003250X
  • Text Lang
    JPN
  • Article Type
    ART
  • ISSN
    09120289
  • NDL Article ID
    6638630
  • NDL Source Classification
    ZN12(科学技術--機械工学・工業--精密機械)
  • NDL Call No.
    Z16-466
  • Data Source
    CJP  NDL  NII-ELS  J-STAGE 
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