球状単結晶シリコンの異方性エッチングによるマイクロ形状創成 Micro Structure Fabrication in Ball Semiconductor by Anisotropic Etching
It is known that a high performance micro system for the medical treatment, biotechnology, and nanotechnology etc, become a system where the electric circuit and the sensor are integrated on flat surface and spherical surface etc. In the future, anisotropic etching for spherical single-crystal silicon can be a key technique in order to develop a higher performance micro system. This paper has investigated the result of microstructure fabrication in spherical single-crystal silicon by anisotropic etching, and proposed a selection indicator in the line direction of mask pattern (crystal orientation), which is corresponded to users.
- 精密工学会誌 = Journal of the Japan Society of Precision Engineering
精密工学会誌 = Journal of the Japan Society of Precision Engineering 69(7), 960-964, 2003-07-05