Polishing Characteristics of Glass Magnetic Disk Substrates Using Elastic Plates

• TOUGE Mutsumi

  熊本大学大学院

• WATANABE Junji

  熊本大学大学部

Bibliographic Information

Other Title

• 弾性定盤を用いたガラス磁気ディスク基板のポリシング特性
• ダンセイ ジョウバン オ モチイタ ガラス ジキ ディスク キバン ノ ポリシング トクセイ

Abstract

Glass disk substrates of 2.5 inch diameter were polished using two types of epoxy resin plate, which were of intermediate hardness between that of the metal lapping plate and polisher. The polishing characteristics were measured for various experimental conditions, such as the grooving condition, polishing pressure, and loose and/or fixed abrasives. From the experimental results, polishing using a combination of epoxy resin plates and CeO₂ abrasives of average diameter 0.7 μm shows a higher removal rate (MRR > 1.0 μm /min) with good surface roughness (Ra < 1.0 nm), flatness (within 0.3 μm in a diameter), and edge accuracy around the substrate. The higher removal rate was achieved due to an increase in the real micro-contact area between the resin plate and substrate. This can be explained well by the comparatively large elastic deformation of the resin plates, which was simulated with the aid of finite element analysis.

Journal

• Journal of the Japan Society for Precision Engineering

  Journal of the Japan Society for Precision Engineering 69 (10), 1469-1473, 2003

  The Japan Society for Precision Engineering

Keywords

• Polishing
• Epoxy Resin Plate
• Glass Magnetic Disk Substrate
• Removal Rate
• Fixed and Loose Grain
• Surface Roughness
• Flatness
• Elastic Deformation

Details

• CRID: 1390001204798309888
• NII Article ID: 110001373507
• NII Book ID: AN1003250X
• DOI: 10.2493/jjspe.69.1469
• ISSN: 1882675X
• ISSN: 09120289
• NDL BIB ID: 6723449
• Web Site: http://id.ndl.go.jp/bib/6723449
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I6723449
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
  • KAKEN
• Abstract License Flag: Disallowed