Direct Metallization of Copper Using Surface Modification and Thermocompression of Polyimide Resin.
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- IKEDA Shingo
- Graduate School of Science, Konan University
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- AKAMATSU Kensuke
- Faculty of Science and Engineering, High Tech. Research Center, Konan University
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- NAWAFUNE Hidemi
- Graduate School of Science, Konan University
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- MIZUMOTO Shozo
- Graduate School of Science, Konan University
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- SEITA Masaru
- LeaRonal Japan Inc.
Bibliographic Information
- Other Title
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- ポリイミド樹脂の表面改質および熱圧着を利用する銅のDirect Metallization
- ポリイミド ジュシ ノ ヒョウメン カイシツ オヨビ ネツ アッチャク オ リヨウ スル ドウ ノ Direct Metallization
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Abstract
A novel method is presented for the direct metallization of copper on a semi-cured polyimide resin substrates by the process of carboxylation of the resin surface, adsorption and reduction of copper ( II ) ions followed by thermocompression bonding. The potassium hydroxide treatment on polyimide resin lead to cleavage of imide ring to form the carboxyl group onto the resin surface, being responsible for the adsorption of copper ( II ) ions. The conductivity of the copper thin film formed by the reduction process was over 1.6×10-2S/_??_ which was suitable for subsequent copper electroplating. The peel strength between polyimide film and copper film was reached to be 1.l0kN/m by thermocompression at 300°C under a pressure of 24.5MPa.
Journal
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- Journal of The Japan Institute of Electronics Packaging
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Journal of The Japan Institute of Electronics Packaging 4 (7), 603-606, 2001
The Japan Institute of Electronics Packaging
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Keywords
Details 詳細情報について
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- CRID
- 1390282679538163584
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- NII Article ID
- 130004062882
- 110001799832
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- NII Book ID
- AA11231565
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- ISSN
- 1884121X
- 13439677
- http://id.crossref.org/issn/13439677
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- NDL BIB ID
- 5963541
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed