Room-Temperature Adsorption of Si Atoms on H-terminated Si(001)-2 * 1 Surface
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- Kajiyama Hiroshi
- Advanced Research Laboratory, Hitachi, Ltd.
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- Suwa Y.
- Advanced Research Laboratory, Hitachi, Ltd.
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- Heike S.
- Advanced Research Laboratory, Hitachi, Ltd.
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- Fujimori M.
- Advanced Research Laboratory, Hitachi, Ltd.
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- Nara J.
- National Research Institute for Metals
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- Ohno T.
- National Research Institute for Metals
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- Matsuura S.
- Department of Superconductivity, University of Tokyo
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- Hitosugi T.
- Department of Superconductivity, University of Tokyo
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- Hashizume T.
- Advanced Research Laboratory, Hitachi, Ltd.
Bibliographic Information
- Other Title
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- Room-Temperature Adsorption of Si Atoms on H-terminated Si(001)-2 x 1 Surface
- Room-Temperature Adsorption of Si Atoms on H-terminated Si(001)-2 ×1 Surface
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Abstract
Room-temperature adsorption of Si atoms on a hydrogen-terminated Si(001)-2×1 surface is studied using scanning tunneling microscopy/spectroscopy and first-principles total-energy calculations. We find that a Si atom adsorbs at the metastable bridge site of a Si dimer forming a SiH2 cluster at room temperature. Although Si adatom has a kinetic energy sufficient to overcome the activation energy at the moment of adsorption, the reaction path to the most stable off-centered inter-bridge site is narrow and the energy dissipation takes place before the transition. The ground-state adsorption is achieved by an annealing of the sample at 520 K.
Journal
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- Journal of the Physical Society of Japan
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Journal of the Physical Society of Japan 74 (1), 389-392, 2005
THE PHYSICAL SOCIETY OF JAPAN
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Details 詳細情報について
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- CRID
- 1390001204187156608
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- NII Article ID
- 110001979382
- 210000105817
- 130004538928
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- NII Book ID
- AA00704814
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- BIBCODE
- 2005JPSJ...74..389K
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- ISSN
- 13474073
- 00319015
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- NDL BIB ID
- 7218432
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed