QUANTITATIVE EVALUATION OF PINHOLE DEFECTS IN TiN FILMS PREPARED BY R.F. REACTIVE SPUTTERING

• UCHIDA Hitoshi

  Department of Mechanical Engineering, Faculty of Engineering

• INOUE Shozo

  Department of Mechanical & Intelligent Engineering, Faculty of Engineering

• NAKANO Yasuhide

  Graduate School of Engineering Himeji Institute of Technology

• KOTERAZAWA Keiji

  Department of Mechanical & Intelligent Engineering, Faculty of Engineering

抄録

Pinhole defects of TiN-coated stainless steels were evaluated potentiodynamically in a deaerated 0.5kmol/m³ H₂SO₄+0.05kmol/m³ KSCN solution at 298K. The TiN films prepared by radio frequency (r.f.) reactive sputtering exhibited the columnar structure with the preferential ‹220› or ‹111› orientation, and they contained more or less pinhole defects. The critical passivation current density i_crit in the TiN-coated specimens decreased considerably with increasing film thickness. Above 1.5μm in thickness, however, there was an increasing tendency in i_crit with cracking and/or peeling. The area ratio of pinhole defects was evaluated by the ratio of i_crit a coated and a non-coated specimen. The result coincided comparatively well with the true defect area ratio based on the optical micrographs before and after anodically polarized. Such electrochemical method was concluded to be a reliable evaluation technique for the pinhole defects of corrosion-resistive coating.

収録刊行物

• 材料

  材料 48 (12Appendix), 265-269, 1999

  公益社団法人 日本材料学会

キーワード

• <i>Dry coating</i>
• <i>Titanium nitride</i>
• <i>R.f. reactive sputtering</i>
• <i>Pinhole defect</i>
• <i>Anodic polarization curve</i>
• <i>Quantitative evaluation</i>

詳細情報

• CRID: 1390282680420216832
• NII論文ID: 110002283850
• NII書誌ID: AA11046472
• DOI: 10.2472/jsms.48.12appendix_265
• ISSN: 18807488
• ISSN: 05145163
• Web Site: http://dl.ndl.go.jp/info:ndljp/pid/10743148
• 本文言語コード: en
• データソース種別:
  • JaLC
  • Crossref
  • NDL-Digital
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可