Preparation of Thick Silica Films by the Electrophoretic Sol-Gel Deposition on a Stainless Steel Sheet

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  • NISHIMORI Hideki
    Department of Applied Materials Science, College of Engineering, Osaka Prefecture University
  • TATSUMISAGO Masahiro
    Department of Applied Materials Science, College of Engineering, Osaka Prefecture University
  • MINAMI Tsutomu
    Department of Applied Materials Science, College of Engineering, Osaka Prefecture University

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  • ゾル・ゲル電気泳動電着法によるステンレス基板上へのシリカ厚膜の作製
  • ゾル ゲル デンキ エイドウ デンチャクホウ ニ ヨル ステンレス キバンジョ

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Abstract

Thick silica films were prepared on a stainless steel sheet by the electrophoretic sol-gel deposition method in the presence of sodium dodecyl sulfate (SDS). Electrophoretic deposition was carried out for the silica sols prepared from tetraethoxysilane under the basic conditions. SDS was added as a dispersant in sol preparation. While deposited films were peeled off during drying process in the absence of SDS, thick films were prepared in the presence of SDS; the maximum thickness of the films was about 20μm at an applied voltage of 30V and an SDS content of 0.05 mass%.

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