Oxidation Behavior of Porous SiC at High Temperatures
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- NANRI Hayato
- Department of Chemistry and Materials Technology, Kyoto Institute of Technology
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- SHIRAI Mitsuru
- Department of Chemistry and Materials Technology, Kyoto Institute of Technology
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- TAKEUCHI Nobuyuki
- Department of Chemistry and Materials Technology, Kyoto Institute of Technology
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- ISHIDA Shingo
- Department of Chemistry and Materials Technology, Kyoto Institute of Technology
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- WATANABE Koji
- Taiko Refractories Co., Ltd.
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- WAKAMATSU Mitsuru
- Taiko Refractories Co., Ltd.
Bibliographic Information
- Other Title
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- 多孔質SiCの高温酸化
- タコウシツ SiC ノ コウオン サンカ
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Abstract
The oxidation behavior of porous high-purity SiC was studied at 1600 and 1700K for 15h in Ar-O2 (PO<sub>2</sub>: 0.02-97kPa) by measuring the oxidation rate. In oxidation at 1600K, only the weight gain of the SiC was observed after the oxidation, and the amount of cristobalite on the oxidized surface increased with increasing PO<sub>2</sub>. In oxidation at 1700K, the weight loss was observed at the oxygen partial pressure of 0.02kPa while the weight gains were observed at an oxygen partial pressures of 2 and 97kPa. The oxidation rate was determined by measuring the evolved gases throughout the oxidation reaction using a mass spectrometer. The oxidation kinetics obeyed the parabolic law under 0.02-97kPa at 1600K and under 2-97kPa at 1700K, indicating that. the passive oxidation occurred. The transition oxygen partial pressure below which the oxidation mechanism changes from passive to the active one, is presumed to be approximately 0.1kPa in the case of the oxidation at 1700K.
Journal
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- Journal of the Ceramic Society of Japan
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Journal of the Ceramic Society of Japan 104 (1212), 738-742, 1996
The Ceramic Society of Japan
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Details 詳細情報について
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- CRID
- 1390001205279364736
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- NII Article ID
- 110002291461
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- NII Book ID
- AN10040326
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- ISSN
- 18821022
- 09145400
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- NDL BIB ID
- 4004661
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed