c軸配向した窒化アルミニウム膜のX線的残留応力解析  [in Japanese] X-Ray Residual Stress Analysis of Aluminum Nitride Film with c-Axis Orientation on Glass Substrate.  [in Japanese]

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Author(s)

Abstract

Crystal structure and residual stresses in AlN films deposited on BLC glass substrates by a magnetron sputtering method were measured by X-ray diffraction method. Deposited AlN films had a columnar structure with its ‹00·1› orientation being perpendicular to the glass substrate. From this structure, the intensity of <i>hk</i>·<i>l</i> diffraction could be measured just only at a particular ψ-angle and, therefore, the so-called sin<sup>2</sup>ψ method could not be applied for measuring their residual stresses. A new stress analyzing method was proposed in the present investigation instead of the sin<sup>2</sup>ψ method.<br>Compressive residual stresses were found in the AlN films deposited under the condition of fairly high nitrogen gas pressure, while tensile residual stresses were found under the condition of low gas pressure.

Journal

  • Journal of the Society of Materials Science, Japan

    Journal of the Society of Materials Science, Japan 42(472), 90-95, 1993

    The Society of Materials Science, Japan

Codes

  • NII Article ID (NAID)
    110002298851
  • NII NACSIS-CAT ID (NCID)
    AN00096175
  • Text Lang
    JPN
  • ISSN
    0514-5163
  • NDL Article ID
    3812144
  • NDL Source Classification
    PD34(性質・組織--非鉄--アルミニウム・マグネシウム)
  • NDL Source Classification
    ZM16(科学技術--科学技術一般--工業材料・材料試験)
  • NDL Call No.
    Z14-267
  • Data Source
    NDL  NII-ELS  J-STAGE 
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