Failure Prediction in Passivated Polycrystalline Line Considering Passivation Thickness

• SASAGAWA Kazuhiko

  Hirosaki University

• HASEGAWA Masataka

  Tohoku University

• SAKA Masumi

  Tohoku University

Bibliographic Information

Other Title

• 806 保護膜の厚さを考慮した保護膜被覆多結晶配線の断線故障予測

Journal

• Proceedings of the 1992 Annual Meeting of JSME/MMD

  Proceedings of the 1992 Annual Meeting of JSME/MMD 2003 (0), 609-610, 2003

  The Japan Society of Mechanical Engineers

Keywords

• Electromigration
• Governing Parameter
• Passivated Polycrystalline Line
• Failure Prediction

Details

• CRID: 1390001206067930880
• NII Article ID: 110002489465
• DOI: 10.1299/jsmezairiki.2003.0_609
• ISSN: 24331287
• Web Site: https://www.jstage.jst.go.jp/article/jsmezairiki/2003/0/2003_609/_pdf
• Text Lang: ja
• Data Source:
  • JaLC
  • Crossref
  • CiNii Articles