125 Study on Particle Detection for Patterned Wafers by Evanescent Light Illumination : Evanescent Light Scattering Simulation by means of FDTD Method

• YOSHIOKA Toshie

  Dept. of Mechanical Engineering and Systems, Osaka University

• MIYOSHI Takashi

  Dept. of Mechanical Engineering and Systems, Osaka University

• TAKAYA Yasuhiro

  Dept. of Mechanical Engineering and Systems, Osaka University

• TAKAHASHI Satoru

  Dept. of Precision Engineering, The University of Tokyo

• TAKAMASU Kiyoshi

  Dept. of Precision Engineering, The University of Tokyo

抄録

The conventional defects inspection technology can't apply to an inspection technique of patterned wafers for the next generation semiconductors, because of physical limits imposed by the wavelength of incident beam. So, we attend to particles existing on the patterned wafer that particularly affects the yield and propose new optical detection for evaluating the nano-particles by using evanescent light based on near field optics. In this paper, to verify the feasibility of this proposed method, computer simulation was performed by means of FDTD method based on Maxwell's equations. The results show that the proposed method is effective for detecting particle (100nm in a diameter) on patterned wafer of 100nm lines and spaces.

収録刊行物

• Proceedings of International Conference on Leading Edge Manufacturing in 21st century : LEM21

  Proceedings of International Conference on Leading Edge Manufacturing in 21st century : LEM21 2003 (0), 129-132, 2003

  一般社団法人 日本機械学会

キーワード

• Evanescent light
• Particle contamination
• Patterned wafers

詳細情報

• CRID: 1390282680875946368
• NII論文ID: 110002498305
• DOI: 10.1299/jsmelem.2003.129
• ISSN: 24243086
• Web Site: https://www.jstage.jst.go.jp/article/jsmelem/2003/0/2003_129/_pdf
• 本文言語コード: en
• データソース種別:
  • JaLC
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可