WS-02 ATOMIC MANIPULATION AND IDENTIFICATION USING NONCONTACT ATOMIC FORCE MICROSCOPE

SUGAWARA Yasuhiro, OYABU Noriaki, CUSTANCE Oscar, YI Insook, MORITA Seizo

doi:10.1299/jsmemipe.2003._w-5_

WS-02 ATOMIC MANIPULATION AND IDENTIFICATION USING NONCONTACT ATOMIC FORCE MICROSCOPE

DOI Web Site

SUGAWARA Yasuhiro

Department of Applied Physics, Graduate School of Engineering, Osaka University
OYABU Noriaki

Department of Electronic Engineerings, Graduate School of Engineering, Osaka University
CUSTANCE Oscar

Handai Frontier Research Center (FRC)
YI Insook

Handai Frontier Research Center (FRC)
MORITA Seizo

Department of Electronic Engineerings, Graduate School of Engineering, Osaka University

抄録

A noncontact atomic force microscope operated at low-temperature is used for vertical manipulation of selected single atoms from the Si(111)7×7 surface. The strong repulsive short-range chemical force interaction between the closest atoms of both tip apex and surface during a soft nanoindentation leads to the removal of a selected silicon atom from its equilibrium position at the surface without additional perturbation of the 7×7 unit cell. Deposition of single atom on a created vacancy at the surface is achieved. These manipulation processes are purely mechanical, since neither bias voltage nor voltage pulse is applied between probe and sample.

収録刊行物

Proceedings of JSME-IIP/ASME-ISPS Joint Conference on Micromechatronics for Information and Precision Equipment : IIP/ISPS joint MIPE

Proceedings of JSME-IIP/ASME-ISPS Joint Conference on Micromechatronics for Information and Precision Equipment : IIP/ISPS joint MIPE 2003 (0), _W-5_-_W-6_, 2003

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