書誌事項
- タイトル別名
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- F-0522 Dynamically Controlled Cure Process in Micro-stereolithography using LCD Mask
抄録
In this paper, we propose a new stereolithography process using a thin film transistor (TFT) liquid crystal display (LCD) mask. Simultaneous exposure based on dynamically controlled cure process enables precise fabrication of 3D structures with the size of submillimeter order. Two types of dynamically controlled cure process such as intermittent mode and continuous mode are developed. This method is realized by optimizing exposure conditions for cure depth control based on a working curve. Fundamental experiments were performed to verify the proposed method. Both a micro-pyramid and micro-gear can be fabricated using intermittent mode. Moreover, continuous mode makes it possible to fabricate a small object with overhang shape.
収録刊行物
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- 年次大会講演論文集
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年次大会講演論文集 VI.01.1 (0), 15-16, 2001
一般社団法人 日本機械学会
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詳細情報 詳細情報について
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- CRID
- 1390001206066414464
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- NII論文ID
- 110002527377
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- ISSN
- 24331325
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可