Ru underlayer effect on the Fe-Si magnetic film
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- Sonehara M.
- Faculty of Engineering, Shinshu University
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- Sugiyama T.
- Faculty of Engineering, Shinshu University
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- Sato T.
- Faculty of Engineering, Shinshu University
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- Yamasawa K.
- Faculty of Engineering, Shinshu University
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- Miura Y.
- Faculty of Engineering, Shinshu University
Bibliographic Information
- Other Title
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- Fe-Si磁性膜に及ぼすRu下地層の効果
- Fe Si ジセイ マク ニ オヨボス Ru シタジソウ ノ コウカ
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Abstract
The Fe-Si magnetic film with an Ru underlayer was fabricated and characterized. In the film, the Fe-Si grain became small when using a very thin Ru underlayer. In addition, the surface roughness of Fe-Si film with a thin Ru underlayer became smaller than that without an Ru underlayer. Consequently, the hard axis coercivity of the Fe-Si film with a 1 nm Ru underlayer was about 1.1 Oe, which was much lower than that of the same film without an Ru underlayer. The Fe-Si film with a 1 nm Ru underlayer had a clear uniaxial magnetic anisotropy (anisotropy field Hk: 18 Oe), a hard axis relative permeability of 900, and a ferromagnetic resonance (FMR) at around 1.6 GHz. A very sharp peak of the imaginary part of permeability μh" was observed at the FMR frequency. This was due to the clear uniaxial magnetic anisotropy and small anisotropy dispersion.
Journal
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- Journal of the Magnetics Society of Japan
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Journal of the Magnetics Society of Japan 29 (8), 826-830, 2005
The Magnetics Society of Japan
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Keywords
Details 詳細情報について
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- CRID
- 1390282680068794880
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- NII Article ID
- 110002811842
- 130004478974
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- NII Book ID
- AN0031390X
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- COI
- 1:CAS:528:DC%2BD2MXpsFChtL4%3D
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- ISSN
- 18804004
- 02850192
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- NDL BIB ID
- 7436747
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- NDL-Digital
- CiNii Articles
- KAKEN
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- Abstract License Flag
- Disallowed