Preparation and Characterization of Mn-Ir/Fe-Si Exchange-Coupled Film for High-frequency Micromagnetic Devices

• Sonehara M.

  Faculty of Engineering, Shinshu University

• Sato T.

  Faculty of Engineering, Shinshu University

• Yamasawa K.

  Faculty of Engineering, Shinshu University

• Miura Y.

  Faculty of Engineering, Shinshu University

• Ikeda S.

  Graduate School of Engineering, Tohoku University

• Yamaguchi M.

  Graduate School of Engineering, Tohoku University

Bibliographic Information

Other Title

• 高周波マイクロ磁気デバイス用Ｍｎ‐Ｉｒ／Ｆｅ‐Ｓｉ交換結合膜の作製と特性評価
• 高周波マイクロ磁気デバイス用Mn-Ir/Fe-Si交換結合膜の作製と特性評価
• コウシュウハ マイクロ ジキ デバイスヨウ Mn Ir Fe Si コウカン ケツゴウ マク ノ サクセイ ト トクセイ ヒョウカ

Abstract

To develop micromagnetic devices for microwave applications, it is necessary to develop magnetic films with a ferromagnetic resonance (FMR) frequency higher than 1 GHz. For this purpose, it is essential that such films should have both high saturation magnetization and large magnetic anisotropy. In the present study, an exchange-coupled multilayer film, consisting of Fe₈₉Si₁₁(at.%) with a saturation magnetization of 19 kG and Mn₈₀Ir₂₀(at.%), was fabricated and characterized. From the experimental results, the Mn-Ir/Fe-Si exchange energy J_ex was estimated to be about 0.1 erg/cm². The [Mn-Ir (10 nm)/Fe-Si (7.2 nm)]₂₁/Mn-Ir (10 nm)/Fe-Si (3.6 nm) multilayer film exhibited FMR at around 6 GHz. In addition, μ' was estimated 40-80, and μ” was nearly equal to zero at low frequencies (f < 4.5 GHz). The exchange bias magnetic field was decreased by thermal process. If the decrease of the FMR frequency due to thermal process is allowed by 10 % of as deposited film, the maximum process temperature must be lowered by 250 °C.

Journal

• Journal of the Magnetics Society of Japan

  Journal of the Magnetics Society of Japan 29 (2), 132-137, 2005

  The Magnetics Society of Japan

Keywords

• micromagnetic devices
• magnetic thin film
• exchange-coupling
• ferromagnetic resonance
• microwave application

Details

• CRID: 1390001205091415808
• NII Article ID: 110002811873
• NII Book ID: AN0031390X
• DOI: 10.3379/jmsjmag.29.132
• COI: 1:CAS:528:DC%2BD2MXjsV2ms78%3D
• ISSN: 18804004
• ISSN: 02850192
• NDL BIB ID: 7234467
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I7234467
• Web Site: http://dl.ndl.go.jp/info:ndljp/pid/10466927
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • NDL-Digital
  • CiNii Articles
  • KAKEN
• Abstract License Flag: Disallowed