Emission characteristics of a radio-frequency powered helium glow-discharge plasma excitation source associated with bias current introduction

DOI NDL Digital Collections Web Site Web Site 3 Citations 26 References

Bibliographic Information

Other Title
  • 自己バイアス電流導入型高周波ヘリウムグロープラズマ励起源の分光特性
  • ジコ バイアス デンリュウ ドウニュウガタ コウシュウハ ヘリウム グロープラズマレイキゲン ノ ブンコウ トクセイ

Search this article

Abstract

In a radio-frequency (r.f.) powered He glow-discharge plasma excitation source, sputtering of the sample atoms scarcely occurs when the bias current is not conducting. However, when the bias current is conducting, the sputtering rate of the sample increases rapidly with increasing the bias current. The maximum sputtering rate of the He excitation source reaches about 1/10 of the sputtering rate of the usual 13.56 MHz Ar glow-discharge plasma excitation source. The emission yield of the r.f. He glow-discharge plasma is found to be over 10-times larger than that of the usual 13.56 MHz Ar glow-discharge plasma. Although a bias current conducting method with an r.f. Ar glow-discharge excitation source becomes ineffective to enhance the excitation of atomic lines having an energy higher than 6.2 eV, the method with r.f. He glow-discharge excitation source is effective for the excitation of emission lines having a high excitation energy. The atomic emission lines of fluorine having an excitation energy larger than 14 eV can be observed with an r.f.-powered He glow-discharge plasma excitation source.<br>

Journal

  • BUNSEKI KAGAKU

    BUNSEKI KAGAKU 52 (6), 439-445, 2003

    The Japan Society for Analytical Chemistry

Citations (3)*help

See more

References(26)*help

See more

Related Projects

See more

Keywords

Details 詳細情報について

Report a problem

Back to top