オージェ電子分光装置によるアルミニウム及びマグネシウム基板上の薄膜からのＸ線光電子測定

DOI NDLデジタルコレクション Web Site Web Site 参考文献9件

書誌事項

タイトル別名
  • Using an Auger electron spectrometer to measure electron beam induced X-ray excited photoelectrons from thin films on Al and Mg substrates.
  • オージェ デンシ ブンコウ ソウチ ニヨル アルミニウム オヨビ マグネシウム

この論文をさがす

抄録

Measurements of the electron beam induced X-ray excited photoelectrons were performed using an Auger electron spectrometer ( JEOL JAMP-7100E). When a focused electron beam is irradiated through a thin film evaporated on a substrate, the electron beam penetrates the substrate and produces characteristic X-rays to induce photoelectrons from elements in the thin film. Differentiated photoelectron spectra of Ag3d, Au4f, Bi4d, Bi4f, Cls, Mn2p, Pb4d, Pb4f and Sn3d from thin films of these elements on the Al substrate were obtained. We applied the conventional equation of XPS intensity to the intensity of electron beam induced X-ray excited photoelectrons. Quantitative analysis of Au-Ag alloys was performed by this method and the results were in good agreement with those obtained by Auger spectroscopy with the relative sensitivity factor method. When an oxidized Cu film on the magnesium substrate was measured by this method, chemical shifts and satellite peaks of the photoelectron peak that are characteristic of Cu(II) can be detected. Lateral resolution of line analysis with this method was found to be much better than that with the conventional XPS spectrometer.

収録刊行物

  • 分析化学

    分析化学 45 (9), 873-877, 1996

    公益社団法人 日本分析化学会

参考文献 (9)*注記

もっと見る

キーワード

詳細情報 詳細情報について

問題の指摘

ページトップへ