Investigation of Influence of Ta and Al on soft Magnetic Behavior in Nitrogenated Iron-Based Films

DOI Web Site 参考文献13件
  • Zheng Daishun
    Research Institute of Magnetic Materials, Lanzhou University
  • Li Xiaohong
    Research Institute of Magnetic Materials, Lanzhou University
  • Xie Tian
    Research Institute of Magnetic Materials, Lanzhou University
  • Wu Dongping
    Key Lab. on magnetism, State Education Ministry
  • Wei Fulin
    Key Lab. on magnetism, State Education Ministry:Research Institute of Magnetic Material, Lanzhou University
  • Yang Zheng
    Key Lab. on magnetism, State Education Ministry
  • MATSUMOTO Mitsunori
    Department of Information Engineering, Shinshu University
  • ITO Kazuyaki
    Department of Information Engineering, Shinshu University

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Fe-Ta-N films and Fe-Al-N films with different composition were prepared by RF reactive sputtering technique, using composite targets with Ar+N_2 mixed gases. The influences of Ta and Al content, sputtering partial nitrogen pressure P(N_2) and annealing temperature T_A on structure and magnetic properties of films were investigated. It is found that the addition of Ta and Al efficiently inhibits the formation of γ-Fe_4N phase in the films. A comparison of influences of additional Ta and Al elements on structure and soft magnetic properties of Fe-N based films was made and the mechanism is discussed in this paper.

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