Influence of Energetic Particles on ZnO Films in the Preparation by Planar Magnetron Sputtering with Obliquely Facing Targets
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- Tominaga Kikuo
- Faculty of Engineering, The University of Tokushima
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- Sueyoshi Yasuhiko
- Faculty of Engineering, The University of Tokushima
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- Imai Hiroshi
- Faculty of Engineering, The University of Tokushima
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- Shirai Masaki
- Faculty of Engineering, The University of Tokushima
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抄録
Substrate temperature dependence of ZnO film properties such as c-axis orientation and optical transmittance was investigated. When the film bombardment became small at higher gas pressure such as 0.1 Torr, the degree of c-axis orientation of the film was improved at above 350°C, but the grain size of film was not dependent on the substrate temperature. When the film-was bombarded by energetic O− ions and O atoms at lower gas pressures, the film was degraded severely. The recovery of the film properties due to the elevated temperature was small. More defects were likely to be induced in the film at a high substrate temperature such as 350°C under film bombardment by the energetic particles.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 31 (9), 3009-3012, 1992
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詳細情報
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- CRID
- 1572824502224943360
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- NII論文ID
- 110003901024
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- NII書誌ID
- AA10457675
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- 本文言語コード
- en
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- データソース種別
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- CiNii Articles