A New Pulsed Laser Deposition Method Using an Aperture Plate

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Author(s)

Abstract

A new off-axis pulsed laser deposition method using an aperture plate is proposed for the purpose of depositing high surface-quality Ta<SUB>2</SUB>O<SUB>5</SUB> thin films without large fragments and/or droplets. The angular distribution of droplets and growth species emitted from the target is examined. Then, the oxygen pressure and laser energy dependencies of the number of droplets and the film thickness are also examined. The results indicate that the aperture plate plays an important role of limiting the path of the traveling droplets and of capturing the droplets traveling toward the off-axis substrate. On the other hand, the film deposition rate is not slow even when using the plate because the species pass through the aperture hole and reach the substrate by scattering. Using a 5 mm aperture plate, a good surface quality Ta<SUB>2</SUB>O<SUB>5</SUB> film is obtained under the optimum condition of 200-300 mTorr oxygen pressure.

Journal

  • Japanese Journal of Applied Physics

    Japanese Journal of Applied Physics 36(2), 704-709, 1997-02

    The Japan Society of Applied Physics

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Codes

  • NII Article ID (NAID)
    110003905647
  • NII NACSIS-CAT ID (NCID)
    AA10457675
  • Text Lang
    ENG
  • Article Type
    ART
  • Journal Type
    大学紀要
  • ISSN
    00214922
  • NDL Article ID
    4176225
  • NDL Source Classification
    ZM35(科学技術--物理学)
  • NDL Call No.
    Z53-A375
  • Data Source
    CJP  NDL  NII-ELS  J-STAGE 
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