A New Pulsed Laser Deposition Method Using an Aperture Plate.
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- Inoue Narumi
- Department of Electrical Engineering, National Defense Academy, 1–10–20 Hashirimizu, Yokosuka 239, Japan
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- Ozaki Tatsuya
- Department of Electrical Engineering, National Defense Academy, 1–10–20 Hashirimizu, Yokosuka 239, Japan
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- Monnaka Toshiaki
- Department of Electrical Engineering, National Defense Academy, 1–10–20 Hashirimizu, Yokosuka 239, Japan
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- Kashiwabara Shigeru
- Department of Electrical Engineering, National Defense Academy, 1–10–20 Hashirimizu, Yokosuka 239, Japan
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- Fujimoto Ryozo
- Department of Electrical Engineering, Nippon Bunri University, 1727–162 Ichiki, Tao, Oita 870–01, Japan
書誌事項
- タイトル別名
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- New Pulsed Laser Deposition Method Usin
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抄録
A new off-axis pulsed laser deposition method using an aperture plate is proposed for the purpose of depositing high surface-quality Ta2O5 thin films without large fragments and/or droplets. The angular distribution of droplets and growth species emitted from the target is examined. Then, the oxygen pressure and laser energy dependencies of the number of droplets and the film thickness are also examined. The results indicate that the aperture plate plays an important role of limiting the path of the traveling droplets and of capturing the droplets traveling toward the off-axis substrate. On the other hand, the film deposition rate is not slow even when using the plate because the species pass through the aperture hole and reach the substrate by scattering. Using a 5 mm aperture plate, a good surface quality Ta2O5 film is obtained under the optimum condition of 200-300 mTorr oxygen pressure.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 36 (2), 704-709, 1997
The Japan Society of Applied Physics
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詳細情報
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- CRID
- 1390282681225918976
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- NII論文ID
- 210000042024
- 110003905647
- 30021829195
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- NII書誌ID
- AA10457675
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- ISSN
- 13474065
- 00214922
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- NDL書誌ID
- 4176225
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
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- 抄録ライセンスフラグ
- 使用不可