Study on Zr-Si/W(100) Surface at High Temperatures by Reflection High Energy Electron Diffraction

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Author(s)

Abstract

Reflection High Energy Electron Diffraction study has revealed that a Zr-Si/W(100) surface has an island structure at the operating temperature of ~ 1300 K. The structure hardly changes when the sample temperature is lowered to room temperature. This result has confirmed the previous work that the Zr-Si/W(100) system does not undergo phase transition as does the Zr-O/W(100) system at ~ 1000 K. The surface properties of the Zr-Si/W(100) system, so long as surface characterization is concerned, hardly change in the range of sample temperature between operating temperature and room temperature.

Journal

  • Japanese Journal of Applied Physics

    Japanese Journal of Applied Physics 38(5), 2951-2952, 1999-05-01

    The Japan Society of Applied Physics

References:  7

  • <no title>

    YAMAGUCHI S.

    Ext.Abstr.(43rd Spring Meet.1996) 28p-E-16

    Cited by (1)

  • <no title>

    LEE S. C.

    Surf. Sci. 330, 289, 1995

    Cited by (6)

  • <no title>

    IROKAWA Y.

    Surf.Sci. 367, 96, 1996

    Cited by (2)

  • <no title>

    KAWANO T.

    Jpn.J.Appl.Phys. 37, 4561, 1998

    Cited by (1)

  • <no title>

    HILL G. E.

    Surf.Sci. 24, 435, 1971

    Cited by (3)

  • <no title>

    NOIMANN Kh.

    Sov.Phys.Solid State 7, 1624, 1966

    Cited by (1)

  • <no title>

    VENEKLASEN L. H.

    J.Appl.Phys. 43, 1600, 1972

    DOI  Cited by (4)

Codes

  • NII Article ID (NAID)
    110003907318
  • NII NACSIS-CAT ID (NCID)
    AA10457675
  • Text Lang
    ENG
  • Article Type
    SHO
  • Journal Type
    大学紀要
  • ISSN
    00214922
  • NDL Article ID
    4743114
  • NDL Source Classification
    ZM35(科学技術--物理学)
  • NDL Call No.
    Z53-A375
  • Data Source
    CJP  NDL  NII-ELS  J-STAGE 
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