Effects of Phosphorus Dopant on the Thermal Stability of Thin Pd_2Si and PtSi Silicide Films on (100) Si Substrates

• JUANG Miin-Horng

  Department of Electronics Engineering, National Taiwan University of Science and Technology

• OU-YANG Chang-I

  Department of Electronics Engineering, National Taiwan University of Science and Technology

• LIN Cheng-Tung

  Department of Electronics Engineering, National Taiwan University of Science and Technology

収録刊行物

• Japanese journal of applied physics. Pt. 1, Regular papers & short notes

  Japanese journal of applied physics. Pt. 1, Regular papers & short notes 38 (7), 4043-4044, 1999-07-01

  社団法人応用物理学会

キーワード

• thermal stability
• phosphorus
• fluorine
• Pd_2Si
• PtSi

詳細情報

• CRID: 1574231877107293952
• NII論文ID: 110003907423
• NII書誌ID: AA10457675
• ISSN: 00214922
• 本文言語コード: en
• データソース種別:
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