Measurement of Ionization and Attachment Coefficients in SF₆ and Xenon Gas Mixtures

• Xiao Deng M.

  Department of Electrical Engineering, Shanghai Jiaotong University, Shanghai 200030, P. R. China

• Liu Hong L.

  Department of Electrical Engineering, Shanghai Jiaotong University, Shanghai 200030, P. R. China

• Qin Ling

  Department of Electrical Engineering, Shanghai Jiaotong University, Shanghai 200030, P. R. China

書誌事項

タイトル別名

• Measurement of Ionization and Attachment Coefficients in SF6 and Xenon Gas Mixtures.

抄録

The Townsend first ionization coefficient α, electron attachment coefficient η and effective ionization coefficient &bar;α (=α-η) in SF₆ and xenon gas mixtures were measured by the steady-state Townsend method for 22.6 <= E/p <= 94 V·mm^-1·kPa^-1 and mixture ratios of 10:90, 25:75, 50:50, 75:25 and 90:10. The limiting E/p in SF₆-Xe, (E/p)_&lim;, which represents E/p for α/P=n/P, was derived from the pre-breakdown current growth measurements, which varies approximately linearly with SF₆ concentration in the SF₆-Xe gas mixtures.

収録刊行物

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 38 (8A), L875-L877, 1999

  The Japan Society of Applied Physics

キーワード

• SF<SUB>6</SUB>
• gas mixtures
• gas discharge
• plasma

詳細情報

• CRID: 1390001206251403648
• NII論文ID: 210000046714
• NII論文ID: 110003921372
• NII書誌ID: AA10650595
• DOI: 10.1143/jjap.38.l875
• ISSN: 13474065
• ISSN: 00214922
• NDL書誌ID: 4821997
• Web Site: http://id.ndl.go.jp/bib/4821997
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4821997
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.38.L875
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.38.L875/pdf
• 本文言語コード: en
• データソース種別:
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• 抄録ライセンスフラグ: 使用不可