Measurements of the CF Radical in DC Pulsed CF4/H2 Discharge Plasma Using Infrared Diode Laser Absorption Spectroscopy

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著者

    • Magane Mitsuo
    • Department of Electronics, Faculty of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464
    • Itabashi Naoshi
    • Department of Electronics, Faculty of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464
    • Nishiwaki Nobuki
    • Department of Electronics, Faculty of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464
    • Goto Toshio
    • Department of Electronics, Faculty of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464
    • Hirota Eizi
    • Institute for Molecular Science, Myodaiji-cho, Okazaki 444

抄録

Infrared diode laser absorption spectroscopy (IRLAS) was established as the measurement method for the CF radical density. The absolute density of the CF radical and its pressure dependences were measured in DC pulsed CF4/H2 discharge plasma. Moreover, from the analysis of the decay parts of the observed transient absorption waveforms of the CF radical, the CF radical was shown to be removed mainly by a diffusion process in the present plasma, yielding the diffusion coefficients $D$(CF in H2) and $D$(CF in CF4).

収録刊行物

  • Jpn J Appl Phys

    Jpn J Appl Phys 29(5), L829-L832, 1990-05-20

    社団法人応用物理学会

被引用文献:  2件中 1-2件 を表示

各種コード

  • NII論文ID(NAID)
    110003923427
  • NII書誌ID(NCID)
    AA10650595
  • 本文言語コード
    EN
  • 資料種別
    雑誌論文
  • ISSN
    0021-4922
  • データ提供元
    CJP引用  NII-ELS  J-STAGE  JSAP 
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