Photo-Enbanced Activation of Hydrogen-Passivated Magnesium in P-Type GaN Films
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- Kamiura Yoichi
- Faculty of Engineering, Okayama University, 3–1–1 Tsushima–naka, Okayama 700–8530, Japan
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- Yamashita Yoshifumi
- Faculty of Engineering, Okayama University, 3–1–1 Tsushima–naka, Okayama 700–8530, Japan
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- Nakamura Shuji
- Department of Research and Development, Nichia Chemical Industries, Ltd., 491 Oka, Kaminaka, Anan, Tokushima 774, Japan
書誌事項
- タイトル別名
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- Photo-Enhanced Activation of Hydrogen-Passivated Magnesium in P-Type GaN Films.
- Photo-Enbanced Activation of Hydrogen-P
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We studied the effect of UV-light irradiation on annealing of as-grown Mg-doped GaN films by resistivity and Hall measurements. The annealing temperature where the resistivity reduction due to the electrical activation of hydrogen-passivated Mg occurred with the increase of hole density and the decrease of hole mobility, was reduced from 550 to 450°C by the irradiation of UV light with a peak wavelength around 350 nm. This suggests that electronic excitation reduces the thermal stability of Mg-H complexes in GaN.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 37 (8B), L970-L971, 1998
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390001206250441856
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- NII論文ID
- 210000044682
- 110003927656
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- NII書誌ID
- AA10650595
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- ISSN
- 13474065
- 00214922
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- NDL書誌ID
- 4550598
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
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- 抄録ライセンスフラグ
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