Transport Parameters of Electron Swarms in SF₆and Argon Gas Mixtures

• Xiao Deng-Ming

  Department of Electrical Engineering, Shanghai Jiaotong University, Shanghai 200030, P.R. China

• Li Hong-Lei

  Department of Electrical Engineering, Shanghai Jiaotong University, Shanghai 200030, P.R. China

• Chen Ya-Zhu

  Department of Electrical Engineering, Shanghai Jiaotong University, Shanghai 200030, P.R. China

書誌事項

タイトル別名

• Transport Parameters of Electron Swarms in SF6 and Argon Gas Mixtures

抄録

The electron swarm growth processes in SF₆-Ar gas mixtures have been studied by a pulsed Townsend method over the range 32.24≤ E/N ≤ 564.2 Td (1 Td=10^-21 V·m²), where E is the electric field and N is the gas density of the mixture. The variation patterns as functions of the density-reduced electric field of the effective ionization coefficient α, electron drift velocity V_e and longitudinal diffusion coefficient D_L in SF₆-Ar gas mixtures have been given. The dielectric strength of SF₆-Ar gas mixtures has also been determined, and found to vary linearly with SF₆ concentration in the gas mixtures.

収録刊行物

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 39 (3AB), L244-L245, 2000

  The Japan Society of Applied Physics

キーワード

• SF<FONT SIZE="-1"><SUB>6</SUB></FONT>
• gas mixtures
• gas discharge
• plasma
• electron swarm coefficients

詳細情報

• CRID: 1390001206270922880
• NII論文ID: 210000048421
• NII論文ID: 110003928600
• NII書誌ID: AA10650595
• DOI: 10.1143/jjap.39.l244
• ISSN: 13474065
• ISSN: 00214922
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.39.L244
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.39.L244/pdf
• 本文言語コード: en
• データソース種別:
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