A New Model Silicon/Silicon Oxide Interface Synthesized from H10Si10O15 and Si(100)-2×1

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  • Zhang K. Z.
    Chemistry Department, University of Michigan, Ann Arbor, MI 48109–1055, USA
  • Meeuwenberg Leah M.
    Chemistry Department, University of Michigan, Ann Arbor, MI 48109–1055, USA
  • Holl Mark M. Banaszak
    Chemistry Department, University of Michigan, Ann Arbor, MI 48109–1055, USA
  • McFeely F. R.
    IBM T. J. Watson Laboratory, P. O. Box 218, Yorktown Heights, NY 10598, USA

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タイトル別名
  • A New Model Silicon/Silicon Oxide Interface Synthesized from H10Si10O15 and Si(100)-2*1.
  • New Model Silicon Silicon Oxide Interfa
  • A New Model Silicon/Silicon Oxide Interface Synthesized from H<sub>10</sub>Si<sub>10</sub>O<sub>15</sub> and Si(100)- 2×1

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A model silicon/silicon oxide interface, synthesized from the spherosiloxane H10Si10O15 and Si(100)-2× 1, has been characterized by study of the Si 2p core-levels and valence band region using soft X-ray photoemission. In addition, the intact H10Si10O15 cluster was condensed at -160° C onto Si(111)-H and characterized. The measured photoemission features are in good agreement with the results of previous model studies.

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