Measurement of Secondary Election Emission Coefficient(γ) of MgO Protective Layer with Various Crystallinities

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  • Choi Eun–Ha
    Charged Particle Beam and Plasma Laboratory, Department of Electrophysics/PDP Research Center, Kwangwoon University, Seoul 139–701, Korea
  • Oh Hyun–Joo
    Charged Particle Beam and Plasma Laboratory, Department of Electrophysics/PDP Research Center, Kwangwoon University, Seoul 139–701, Korea
  • Kim Young–Guon
    Charged Particle Beam and Plasma Laboratory, Department of Electrophysics/PDP Research Center, Kwangwoon University, Seoul 139–701, Korea
  • Ko Jae–Jun
    Charged Particle Beam and Plasma Laboratory, Department of Electrophysics/PDP Research Center, Kwangwoon University, Seoul 139–701, Korea
  • Lim Jae–Yong
    Charged Particle Beam and Plasma Laboratory, Department of Electrophysics/PDP Research Center, Kwangwoon University, Seoul 139–701, Korea
  • Kim Jin–Goo
    Charged Particle Beam and Plasma Laboratory, Department of Electrophysics/PDP Research Center, Kwangwoon University, Seoul 139–701, Korea
  • Kim Dae–Il
    Charged Particle Beam and Plasma Laboratory, Department of Electrophysics/PDP Research Center, Kwangwoon University, Seoul 139–701, Korea
  • Cho Guangsup
    Charged Particle Beam and Plasma Laboratory, Department of Electrophysics/PDP Research Center, Kwangwoon University, Seoul 139–701, Korea
  • Kang Seung–Oun
    Charged Particle Beam and Plasma Laboratory, Department of Electrophysics/PDP Research Center, Kwangwoon University, Seoul 139–701, Korea

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タイトル別名
  • Measurement of Secondary Electron Emission Coefficient (.GAMMA.) of MgO Protective Layer with Various Crystallinities.
  • Measurement of Secondary Election Emission Coefficient ガンマ of MgO Protective Layer with Various Crystallinities
  • Measurement of Secondary Electron Emission Coefficient (γ) of MgO Protective Layer with Various Crystallinities

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抄録

The secondary electron emission coefficient γ of a MgO protective layer with various crystallinities has been successfully measured by the γ-focused ion beam system with complete elimination of the charge accumulation problem by scanning-area adjustment techniques. It is found that the (111) surface has the highest γ from 0.14 to 0.26 in comparison with the other films with (200) and (220) crystallinities for operating Ne+ ions, while ranged from 0.03 to 0.24 for Ar+ ions, under operating ion energies from 50 eV to 500 eV throughout this experiment. These observations explain why the (111) crystallinity of the MgO protective layer plays an important role in lowering the firing voltages in AC plasma display panel compared to the films with other crystallinities.

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