Fabrication of Si Field Emitter Tip for Three-Dimensional Vacuum Magnetic Sensor

  • Uemura Koji
    Tsukuba Laboratory, Yaskawa Electric Co., Ltd., 5–9–10 Tohkohdai, Tsukuba–shi, Ibaraki 300–26, Japan
  • Kanemaru Seigo
    Electrotechnical Laboratory, 1–1–4 Umezono, Tsukuba–shi, Ibaraki 305, Japan
  • Itoh Junji
    Electrotechnical Laboratory, 1–1–4 Umezono, Tsukuba–shi, Ibaraki 305, Japan

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タイトル別名
  • Fabrication of Si Field Emitter Tip for a Three-Dimensional Vacuum Magnetic Sensor.

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A new Si field emitter tip generating a cross-shaped electron beam was fabricated for a three-dimensional vacuum magnetic sensor (VMS) application. The present tip is surrounded by a gate for field emission, and a focusing lens is made in the same plane as the gate. The beam current of about 50 nA was obtained with a single tip at the gate and lens voltages of 55 V and 10 V, respectively. The fabrication process and beam characteristics are described. Preliminary results such as linearity and sensitivity of VMS using the present tip are also discussed.

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