Fabrication of Si Field Emitter Tip for Three-Dimensional Vacuum Magnetic Sensor
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- Uemura Koji
- Tsukuba Laboratory, Yaskawa Electric Co., Ltd., 5–9–10 Tohkohdai, Tsukuba–shi, Ibaraki 300–26, Japan
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- Kanemaru Seigo
- Electrotechnical Laboratory, 1–1–4 Umezono, Tsukuba–shi, Ibaraki 305, Japan
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- Itoh Junji
- Electrotechnical Laboratory, 1–1–4 Umezono, Tsukuba–shi, Ibaraki 305, Japan
書誌事項
- タイトル別名
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- Fabrication of Si Field Emitter Tip for a Three-Dimensional Vacuum Magnetic Sensor.
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抄録
A new Si field emitter tip generating a cross-shaped electron beam was fabricated for a three-dimensional vacuum magnetic sensor (VMS) application. The present tip is surrounded by a gate for field emission, and a focusing lens is made in the same plane as the gate. The beam current of about 50 nA was obtained with a single tip at the gate and lens voltages of 55 V and 10 V, respectively. The fabrication process and beam characteristics are described. Preliminary results such as linearity and sensitivity of VMS using the present tip are also discussed.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 35 (12B), 6629-6631, 1996
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390001206250269056
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- NII論文ID
- 210000040105
- 110003955333
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- NII書誌ID
- AA10457675
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- ISSN
- 13474065
- 00214922
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- NDL書誌ID
- 4639274
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可