単結晶ダイヤモンドドリルを用いた単結晶シリコンの高品位穴加工単結晶シリコンの高品位穴加工

• 横溝 精一

  岡山県工業技術センター

• 窪田 真一郎

  岡山県工業技術センター

• 宇野 義幸

  岡山大学大学院自然科学研究科

書誌事項

タイトル別名

• High Performance Drilling of Monocrystalline Silicon Using Monocrystalline Diamond Drill
• タンケッショウ ダイヤモンドドリル オ モチイタ タンケッショウ シリコン ノ コウヒンイ アナカコウ

抄録

Monocrystalline silicon is the most important material for semiconductor industry, and is also widely used as a component material of the semiconductor manufacturing equipment which needs the precision machining. However the high performance machining technology without micro cracks for brittle materials has not yet been established. Especially the high aspect ratio drilling less than 1 mm in diameter is very difficult. Therefore, the new drilling method of monocrystalline silicon was introduced in this paper. The experimental analysis made it clear that the mirror finished surface without micro cracks was obtained by using the monocrystalline diamond drill, while many micro cracks were generated in the case of sintered diamond drill. Furthermore, the removal rate and the tool life were enough for high performance drilling.

収録刊行物

• 精密工学会誌論文集

  精密工学会誌論文集 72 (2), 234-238, 2006

  公益社団法人 精密工学会

キーワード

• monocrystalline silicon
• monocrystalline diamond drill
• drilling
• micro crack
• reactive ion etching
• brittle material

詳細情報

• CRID: 1390282680256836864
• NII論文ID: 110004028572
• NII書誌ID: AA11966630
• DOI: 10.2493/jspe.72.234
• ISSN: 18818722
• ISSN: 13488716
• ISSN: 13488724
• NDL書誌ID: 7826303
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I7826303
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可