放射光による大面積微細加工システム(OS10 次世代アクチュエータのマイクロ・ナノ加工)

• 内海 裕一

  兵庫県大

• 岸本 武文

  兵庫県大

• 銘苅 春隆

  兵庫県大

• 服部 正

  兵庫県大

書誌事項

タイトル別名

• Large Area Microfabrication System using Synchrotron Radiation

抄録

We developed the new x-ray exposure system using synchrotron radiation (SR) at New SUBARU of laboratory of advanced science and technology for industry (LASTI), University of Hyogo. The new beamline consists from two-stacked beamlines with the different x-ray source energies; one is for the high energies (high energy beamline) from 3 to 15 keV and the another beamline is for the low energies (low energy beamline) from 100 eV to 3 keV. The apparatus has been designed for the fabrication of microstructures with the wider size range from submicron to milimeter at wider fabrication area of A4 size. In this paper the outline of the new LIGA x-ray lithography system and the quality of the fabricated microstructure are described.

収録刊行物

• 機素潤滑設計部門講演会講演論文集

  機素潤滑設計部門講演会講演論文集 2004.4 (0), 73-74, 2004

  一般社団法人 日本機械学会

キーワード

• X-ray Lithography
• Microsystem
• Micromachine
• Synchrotron Radiation
• LIGA

詳細情報

• CRID: 1390001205891849856
• NII論文ID: 110004056879
• DOI: 10.1299/jsmemdt.2004.4.73
• ISSN: 24243051
• Web Site: https://www.jstage.jst.go.jp/article/jsmemdt/2004.4/0/2004.4_73/_pdf
• 本文言語コード: ja
• データソース種別:
  • JaLC
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可