Observation of Exciton-Polariton Emissions from a ZnO Epitaxial Film on the a-Face of Sapphire Grown by Radical-Source Molecular-Beam-Epitaxy.
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- Chichibu Shigefusa F.
- Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8573, Japan Photodynamics Research Center, RIKEN (Institute of Physical and Chemical Research), Aoba, Sendai, Miyagi 980-0845, Japan
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- Sota Takayuki
- Department of Electrical, Electronics, and Computer Engineering, Waseda University, 3-4-1 Ohkubo, Shinjuku, Tokyo 169-8555, Japan
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- Fons Paul J.
- Photonic Research Institute, National Institute of Advance Industrial Science & Technology (AIST), Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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- Iwata Kakuya
- Photonic Research Institute, National Institute of Advance Industrial Science & Technology (AIST), Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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- Yamada Akimasa
- Photonic Research Institute, National Institute of Advance Industrial Science & Technology (AIST), Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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- Matsubara Koji
- Photonic Research Institute, National Institute of Advance Industrial Science & Technology (AIST), Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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- Niki Shigeru
- Photonic Research Institute, National Institute of Advance Industrial Science & Technology (AIST), Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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抄録
Exciton-polariton emissions were observed at 8 K in the photoluminescence spectrum of a ZnO epitaxial film on the a-face of sapphire grown by radical-source molecular-beam-epitaxy. The resonance energies of corresponding photoreflectance structures agreed with those of longitudinal and transverse excitons, i.e. upper and lower polariton branches, where A, B and C-excitons couple simultaneously to an electromagnetic wave. In contrast to the results obtained for GaN, longitudinal-transverse splitting of the B-excitonic polariton was resolved, which is due to the large oscillator strength.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 41 (8B), L935-L937, 2002
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390282681233683584
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- NII論文ID
- 110004081117
- 130004530060
- 210000052955
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- NII書誌ID
- AA10650595
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- ISSN
- 13474065
- 00214922
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- NDL書誌ID
- 6238097
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可