Broadband Antireflection Gratings for Glass Substrates Fabricated by Fast Atom Beam Etching.

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  • Kanamori Yoshiaki
    Department of Mechatronics and Precision Engineering, Tohoku University, Aoba-01, Aoba-ku, Sendai 980-8579, Japan
  • Kikuta Hisao
    Department of Mechanical Systems Engineering, College of Engineering, Osaka Prefecture University,<BR> 1-1 Gakuen-cho, Sakai, Osaka 599-8531, Japan
  • Hane Kazuhiro
    Department of Mechatronics and Precision Engineering, Tohoku University, Aoba-01, Aoba-ku, Sendai 980-8579, Japan

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Abstract

We fabricated a two-dimensional subwavelength-structured (SWS) surface on a glass substrate. The SWS surface was patterned by electron-beam lithography and etched by an SF6 fast atom beam. The SWS surface consisted of tapered gratings with a 150 nm period and a 150 nm deep groove. The reflectivity at wavelengths from 400 nm to 2000 nm was measured and compared with the results calculated on the basis of rigorous coupled-wave analysis. At wavelengths from 400 nm to 800 nm, the reflectivity of the glass surface decreased to 1% from the original value of 5% of the glass substrate. The reflectivity was also examined as a function of the incident angle by using He–Ne laser light.

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