Cell Library Development Methodology for Throughput Enhancement of Character Projection Equipment

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Author(s)

Abstract

We propose a cell library development methodology for throughput enhancement of character projection equipment. First, an ILP (Integer Linear Programming)-based cell selection is proposed for the equipment for which both of the CP (Character Projection) and VSB (Variable Shaped Beam) methods are available, in order to minimize the number of electron beam (EB) shots, that is, time to fabricate chips. Secondly, the influence of cell directions on area and delay time of chips is examined. The examination helps to reduce the number of EB shots with a little deterioration of area and delay time because unnecessary directions of cells can be removed. Finally, a case study is shown in which the numbers of EB shots are shown for several cases.

Journal

  • IEICE Trans. Electronics, C

    IEICE Trans. Electronics, C 89(3), 377-383, 2006-03-01

    The Institute of Electronics, Information and Communication Engineers

References:  10

Cited by:  7

Codes

  • NII Article ID (NAID)
    110004656681
  • NII NACSIS-CAT ID (NCID)
    AA10826283
  • Text Lang
    ENG
  • Article Type
    Journal Article
  • ISSN
    09168524
  • Data Source
    CJP  CJPref  NII-ELS 
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