エアロゾルデポジション法による緻密イットリア膜の室温形成  [in Japanese] Dense Yttrium Oxide Film Prepared by Aerosol Deposition Process at Room Temperature  [in Japanese]

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Author(s)

Abstract

Dense yttrium oxide film was prepared by aerosol deposition process at room temperature. The deposition rate was very high ~60 μm/h. The thickness of the films were 25 μm and 10 μm on aluminum alloy and quartz substrates, respectively. Transmission electron microscopy showed that the film was highly dense without voids and had a homogeneous interface between the layer and the quartz substrate used. The film was composed of randomly oriented Y<sub>2</sub>O<sub>3</sub> crystallites of size less than 20 nm. The film (2 μm thick) had a 55-85% transmittance in the region 250-800 nm. Electrical and mechanical properties of the film were examined. The volume resistivity of the film was 10<sup>14</sup> Ω•cm. The adhesion force of the interface between the Y<sub>2</sub>O<sub>3</sub> layer and the substrate was 59 MPa.<br>

Journal

  • Journal of the Ceramic Society of Japan

    Journal of the Ceramic Society of Japan 114(1327), 272-276, 2006-03-01

    The Ceramic Society of Japan

References:  21

Cited by:  7

Codes

  • NII Article ID (NAID)
    110004656838
  • NII NACSIS-CAT ID (NCID)
    AN10040326
  • Text Lang
    JPN
  • Article Type
    Journal Article
  • ISSN
    09145400
  • NDL Article ID
    7864719
  • NDL Source Classification
    ZP9(科学技術--化学・化学工業--無機化学・無機化学工業--セラミックス・窯業)
  • NDL Call No.
    Z17-249
  • Data Source
    CJP  CJPref  NDL  NII-ELS  J-STAGE 
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